FACILITIES
ITFSI has a wide range of resources for producing high quality research outputs. These give the institute capabilities in characterisation, modelling, sensors & imaging. The institute has a wide range of deposition and metrology equipment, from high-throughput sputtering systems to scanning electron microscopy. The new clean room facilities, including advanced thin film deposition and characterization technologies, have been officially opened in February 2020 (Vimeo and Youtube)
Facilities Menu
Thin Film Deposition Systems
CVC AST304 RF Magnetron Sputtering system has two targets available and is equipped with a cryopump for reaching high-vacuum.
Satis 370 is a custom electron-beam deposition system, recently updated to do co-deposition and is equipped with a ITFSI designed plasma source for plasma-enhanced electron beam deposition.
Microwave-plasma assisted pulsed-DC sputtering system is capable of producing high quality optical thin films. For more information, click here.
Molecular beam epitaxy system (located at Gas Sensing Solutions Ltd. West of Scotland Science Park, Glasgow). Shared facility with Gas Sensing Solutions Ltd, Glasgow, Strathclyde, Stanford USA and West of Scotland universities.
PECVD system for producing high quality diamond like carbon (DLC) coatings. This system at ITFSI is equipped with a hollow cathode.
PlasmaCoat RF Sputtering system is a small-batch, high-throughput deposition system. At ITFSI, there are two PlasmaCoat sputtering systems. For more information, please click here.
Analytical Techniques at ITFSI
Aquila nkd 8000 optical spectrometer can simultaneously measure the transmission and reflection data within the visible/near-IR range.
Thermo Fisher Scientific DXR Raman microscope is capable of measuring Raman scattering as well as enabled for SERS applications. For more information, click here.
Thermo Fisher Scientific Nicolet iS50 FTIR has accessories for measuring the IR transmission and reflection. Chamber can be flushed out with nitrogen to remove effects from carbon dioxide.
Hitachi S4100 electron microscope equipped with a new Oxford Instruments EDS detector. For more information, please click here.
Siemens D5000 X-Ray Diffractometer is equipped with a copper x-ray source and can take a range of different measurement settings. Particularly used in the identification of crystal phases in samples.
ITFSI has ellipsometry capabilities for sample optical analysis.
MPAS Sputtering System
MPAS is microwave plasma assisted sputter deposition. Equipment designed and built by ITFSI with support from InnovateUK. Provides a novel patented deposition technology based on use of microwave plasma to assist sputter deposited high precision optical coatings.
Click the first link below to see more information.
