The collaboration with Professor Reid's group and ITFSI has led to the publication of amorphous silicon with extremely low absorption at 1550 nm. This article can be found through:
Birney, R.; Steinlechner, J.; Tornasi, Z.; MacFoy, S.; Vine, D.; Bell, A. S.; Gibson, D.; Hough, J.; Rowan, S.; Sortais, P.; Sproules, S.; Tait, S.; Martin, I. W.; Reid, S. Amorphous Silicon with Extremely Low Absorption: Beating Thermal Noise in Gravitational Astronomy. Phys. Rev. Lett. 2018, 121, 191101, doi:10.1103/PhysRevLett.121.191101.
Comments